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We demonstrated conformal Al₂O₃ passivation via atomic layer deposition (ALD) of a flexible Ag network electrode possessing a high aspect ratio. The Ag network electrode passivated by the ALD-grown Al₂O₃ film demonstrated constant optical transmittance and mechanical flexibility relative to the bare Ag network electrode. Owing to the conformal deposition of the Al₂O₃ layer on the high aspect ratio Ag network electrode, the electrode exhibited more favorable stability than its bare Ag-network counterpart. To demonstrate the feasibility of Al₂O₃ passivation via ALD on a flexible Ag network, the performances of flexible and transparent thin-film heaters (TFHs) with both a bare Ag network and that passivated by ALD-grown Al₂O₃ were compared. The performance of Al₂O₃/Ag network-based TFHs was minimally altered even after harsh environmental tests at 85% relative humidity and a temperature of 85 °C, while the performance of bare electrode-based TFHs significantly deteriorated. The improved stability and reliability of the Al₂O₃/Ag network-based TFHs indicate that the ALD-grown Al₂O₃ film effectively prevents the introduction of moisture and impurities into the Ag network with a high aspect ratio. The improvement in the stability of the Ag network through Al₂O₃ passivation implies that the ALD-grown Al₂O₃ film represents a promising transparent and flexible thin film passivation material for high quality Ag network electrodes with high aspect ratios.