High Volatile Antimony(III) Precursors for Metal Oxide Thin Film Deposition
oleh: Ji-Seoung Jeong, Sunyoung Shin, Bo Keun Park, Seung Uk Son, Taek-Mo Chung, Ji Yeon Ryu
| Format: | Article |
|---|---|
| Diterbitkan: | American Chemical Society 2024-07-01 |
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