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Growth Mechanism of SmB<sub>6</sub> Nanowires Synthesized by Chemical Vapor Deposition: Catalyst-Assisted and Catalyst-Free
oleh: Yi Chu, Yugui Cui, Shaoyun Huang, Yingjie Xing, Hongqi Xu
| Format: | Article |
|---|---|
| Diterbitkan: | MDPI AG 2019-07-01 |
Deskripsi
SmB<sub>6</sub> nanowires, as a prototype of nanostructured topological Kondo insulator, have shown rich novel physical phenomena relating to their surface. Catalyst-assisted chemical vapor deposition (CVD) is a common approach to prepare SmB<sub>6</sub> nanowires and Ni is the most popular catalyst used to initiate the growth of SmB<sub>6</sub> nanowires. Here, we study the effect of growth mechanism on the surface of SmB<sub>6</sub> nanowires synthesized by CVD. Two types of SmB<sub>6</sub> nanowires are obtained when using Ni as the catalyst. In addition to pure SmB<sub>6</sub> nanowires without Ni impurity, a small amount of Ni is detected on the surface of some SmB<sub>6</sub> nanowires by element analysis with transmission electron microscopy. In order to eliminate the possible distribution of Ni on nanowire surface, we synthesize single crystalline SmB<sub>6</sub> nanowires by CVD without using catalyst. The difference between catalyst-assisted and catalyst-free growth mechanism is discussed.