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This paper presents the realization of TiC thin films by CVD method. The thin layers of TiC thicknesses were 8 and 10 μm, their thickness increasing with time, keeping the temperature. Diffractometer analysis certifies that this thin layer of TiC is homogeneous and unscratched. Microhardness of thin layers of TiC is HV0,05 = 30000 MPa compared to WC (carbide substrate of the component) that has a microhardness HV0,05 = 17000MPa.