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TiO₂-SiO₂ thin films were created on Corning glass substrates using a simple method. Nine layers of SiO₂ were deposited; later, several layers of TiO₂ were deposited, and their influence was studied. Raman spectroscopy, high resolution transmission electron spectroscopy (HRTEM), an X-ray diffractometer (XRD), ultraviolet-visible spectroscopy (UV-Vis), a scanning electron microscope (SEM), and atomic force microscopy (AFM) were used to describe the sample’s shape, size, composition, and optical characteristics. Photocatalysis was realized through an experiment involving the deterioration of methylene blue (MB) solution exposed to UV-Vis radiation. With the increase of TiO₂ layers, the photocatalytic activity (PA) of the thin films showed an increasing trend, and the maximum degradation efficiency of MB by TiO₂-SiO₂ was 98%, which was significantly higher than that obtained by SiO₂ thin films. It was found that an anatase structure was formed at a calcination temperature of 550 °C; phases of brookite or rutile were not observed. Each nanoparticle’s size was 13–18 nm. Due to photo-excitation occurring in both the SiO₂ and the TiO₂, deep UV light (λ = 232 nm) had to be used as a light source to increase photocatalytic activity.