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Thermal Desorption of Argon Implanted into Gallium Arsenide
oleh: Marcin Turek, Andrzej Droździel, Krzysztof Pyszniak, Paweł Węgierek
Format: | Article |
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Diterbitkan: | Lublin University of Technology 2022-10-01 |
Deskripsi
Thermal desorption of Ar implanted with energies 150 keV and 100 keV with fluence 1×10^16 cm^-2 into GaAs is considered. A sudden release of Ar is observed in temperature range 1100 -1180 K as a single narrow peak in TDS (Thermal Desorption Spectroscopy) spectra. This is accompanied by a strong background signal from atmospheric Ar trapped in various parts of the spectrometer. Desorption peak shift analysis allows estimation of desorption activation energy values - these are 3.6 eV and 2.5 eV for implantation energies 150 keV and 100 keV, respectively. These results are comparable to that measured for Ar implanted into germanium target.