Error Model and Frequency Modulation Characteristics Analysis of Laser Processing Platform for Micro Crystal Resonator

oleh: Jian Hu, Zhihang Li, Yanlin Wu, Xindong Yu, Gangyan Li

Format: Article
Diterbitkan: MDPI AG 2022-01-01

Deskripsi

Laser processing platform for micro crystal resonator (MCR) frequency modulation is an important piece of equipment to apply laser etching technology to the MCR frequency modulation process. The positioning accuracy of the laser processing platform has an important influence on frequency modulation characteristics. In order to improve the precision and efficiency of the laser processing platform for MCR frequency modulation, the error model of the laser processing platform for MCR frequency modulation is established based on the multi-body system theory. According to the Monte Carlo simulation method, the influence of laser processing platform error for MCR on frequency modulation characteristics is analyzed. Considering the requirements of the MCR frequency modulation process, the laser processing platform for MCR frequency modulation is built, and the frequency deviation and frequency modulation performance are verified to meet the engineering requirements.