Top-down patterning of topological surface and edge states using a focused ion beam
oleh: Abdulhakim Bake, Qi Zhang, Cong Son Ho, Grace L. Causer, Weiyao Zhao, Zengji Yue, Alexander Nguyen, Golrokh Akhgar, Julie Karel, David Mitchell, Zeljko Pastuovic, Roger Lewis, Jared H. Cole, Mitchell Nancarrow, Nagarajan Valanoor, Xiaolin Wang, David Cortie
| Format: | Article |
|---|---|
| Diterbitkan: | Nature Portfolio 2023-03-01 |
Deskripsi
Topological edge states offer the prospect of dissipationless transport for nanoelectronics, but a precise method to spatially engineer such nanoscale conducting channels is still lacking. Here, the authors demonstrate patterning of topological boundary states in Sb2Te3 using a focused ion beam to create amorphous, topologically trivial regions.