Using Temperature-Programmed Photoelectron Emission (TPPE) to Analyze Electron Transfer on Metallic Copper and Its Relation to the Essential Role of the Surface Hydroxyl Radical

oleh: Yoshihiro Momose

Format: Article
Diterbitkan: MDPI AG 2024-01-01

Deskripsi

Surface processes such as coatings, corrosion, photocatalysis, and tribology are greatly diversified by acid–base interactions at the surface overlayer. This study focuses on the action of a metallic copper surface as an electron donor/acceptor related to the inactivation of viruses. It was found that regarding Cu<sub>2</sub>O or Cu materials, electrostatic interaction plays a major role in virus inactivation. We applied the TPPE method to clarify the mechanism of electron transfer (<i>ET</i>) occurring at light-irradiated copper surfaces. The TPPE characteristics were strongly influenced by the environments, which correspond to the temperature and environment dependence of the total count of emitted electrons in the incident light wavelength scan (PE total count, <i>N</i><sub>T</sub>), the photothreshold, and further the activation energy (Δ<i>E</i>) analyzed from the Arrhenius plot of <i>N</i><sub>T</sub> values obtained in the temperature increase and subsequent temperature decrease processes. In this study, we re-examined the dependence of the TPPE data from two types of Cu metal surfaces: sample A, which was mechanically abraded in alcohols, water, and air, and sample C, which was only ultrasonically cleaned in these liquids. The <i>N</i><sub>T</sub> for both samples slowly increased with increasing temperature, reached a maximum (<i>N</i><sub>Tmax</sub>) at 250 °C (maximum temperature, <i>T</i><sub>max</sub>), and after that, decreased. For sample A, the <i>N</i><sub>Tmax</sub> value decreased in the order H<sub>2</sub>O > CH<sub>3</sub>OH > C<sub>2</sub>H<sub>5</sub>OH > (CH<sub>3</sub>)<sub>2</sub>CHOH > C<sub>3</sub>H<sub>7</sub>OH, although the last alcohol gave <i>T</i><sub>max</sub> = 100 °C, while with sample C, the <i>N</i><sub>Tmax</sub> value decreased in the order C<sub>3</sub>H<sub>7</sub>OH > (CH<sub>3</sub>)<sub>2</sub>CHOH > C<sub>2</sub>H<sub>5</sub>OH > CH<sub>3</sub>OH > H<sub>2</sub>O. Interestingly, both orders of the liquids were completely opposite; this means that a Cu surface can possess a two-way character. The <i>N</i><sub>T</sub> intensity was found to be strongly associated with the change from the hydroxyl group (–Cu–OH) to the oxide oxygen (O<sup>2−</sup>) in the O1s spectra in the XPS measurement. The difference between the above orders was explained by the acid–base interaction mode of the –Cu–OH group with the adsorbed molecule on the surfaces. The H<sub>2</sub>O adsorbed on sample A produces the electric dipole –CuO<sup>δ−</sup>H<sup>δ+</sup> ⋅⋅⋅ :OH<sub>2</sub> (⋅⋅⋅ hydrogen bond), while the C<sub>3</sub>H<sub>7</sub>OH and (CH<sub>3</sub>)<sub>2</sub>CHOH adsorbed on sample C produce RO<sup>−δ</sup>H<sup>δ+</sup> ⋅⋅⋅ :O(H)–Cu− (R = alkyl groups). Gutmann’s acceptor number (<i>AN</i>) representing the basicity of the liquid molecules was found to be related to the TPPE characteristics: (CH<sub>3</sub>)<sub>2</sub>CHOH (33.5), C<sub>2</sub>H<sub>5</sub>OH (37.1), CH<sub>3</sub>OH (41.3), and H<sub>2</sub>O (54.8) (the <i>AN</i> of C<sub>3</sub>H<sub>7</sub>OH could not be confirmed). With sample A, the values of <i>N</i><sub>Tmax</sub>a and Δ<i>E</i>a<sub>Up1</sub> both increased with increasing <i>AN</i> (Up1 means the first temperature increase process). On the other hand, with sample C, the values of <i>N</i><sub>Tmax</sub>c and Δ<i>E</i>c<sub>Up1</sub> both decreased with increasing <i>AN</i>. These findings suggest that sample A acts as an acid, while sample C functions as a base. However, in the case of both types of samples, A and C, the <i>N</i><sub>Tmax</sub> values were found to increase with increasing Δ<i>E</i><sub>Up1</sub>. It was explained that the Δ<i>E</i><sub>Up1</sub> values, depending on the liquids, originate from the difference in the energy level of the hydroxyl group radical at the surface denoted. This is able to attract electrons in the neighborhood of the Fermi level of the base metal through tunnelling. After that, Auger emission electrons are released, contributing to the <i>ET</i> in the overlayer. These electrons are considered to have a strong ability of reducibility.