Design and Investigation of the High Performance Doping-Less TFET with Ge/Si<sub>0.6</sub>Ge<sub>0.4</sub>/Si Heterojunction
oleh: Tao Han, Hongxia Liu, Shupeng Chen, Shulong Wang, Wei Li
| Format: | Article |
|---|---|
| Diterbitkan: | MDPI AG 2019-06-01 |
Deskripsi
A high performance doping-less tunneling field effect transistor with Ge/Si<sub>0.6</sub>Ge<sub>0.4</sub>/Si heterojunction (H-DLTFET) is proposed in this paper. Compared to the conventional doping-less tunneling field effect transistor (DLTFET), the source and channel regions of H-DLTFET respectively use the germanium and Si<sub>0.6</sub>Ge<sub>0.4</sub> materials to get the steeper energy band, which can also increase the electric field of source/channel tunneling junction. Meanwhile, the double-gate process is used to improve the gate-to-channel control. In addition, the effects of Ge content, electrode work functions, and device structure parameters on the performance of H-DLTFET are researched in detail, and then the above optimal device structure parameters can be obtained. Compared to the DLTFET, the simulation results show that the maximum on-state current, trans-conductance, and output current of H-DLTFET are all increased by one order of magnitude, whereas the off-state current is reduced by two orders of magnitude, so the switching ratio increase by three orders of magnitude. At the same time, the cut-off frequency and gain bandwidth product of H-DLTFET increase from 1.75 GHz and 0.23 GHz to 23.6 GHz and 4.69 GHz, respectively. Therefore, the H-DLTFET is more suitable for the ultra-low power integrated circuits.