Structure and Mechanical Properties of PVD and CVD TiAlSiN Coatings Deposited on Cemented Carbide
oleh: Liying Wu, Lianchang Qiu, Yong Du, Fangfang Zeng, Qiang Lu, Zhuopeng Tan, Lei Yin, Liyong Chen, Jifei Zhu
| Format: | Article |
|---|---|
| Diterbitkan: | MDPI AG 2021-05-01 |
Deskripsi
This work reports the results of our investigation of the structure and mechanical properties of physical vapor deposition (PVD) and chemical vapor deposition (CVD) TiAlSiN coatings deposited on cemented carbide substrates. For the first time, a novel nanocomposite of Ti<sub>0.13</sub>Al<sub>0.85</sub>Si<sub>0.02</sub>N coating deposited from TiCl<sub>4</sub>-AlCl<sub>3</sub>-SiCl<sub>4</sub>-NH<sub>3</sub>-H<sub>2</sub> gas precursors was prepared by low pressure chemical vapor deposition (LPCVD) at 780 °C and a pressure of 60 mbar, while PVD Ti<sub>0.31</sub>Al<sub>0.60</sub>Si<sub>0.09</sub>N coating was prepared using the arc ion plating method. The investigation results including morphology, microstructure, chemical composition, phase component, and hardness were carried out by scanning electron microscopy (SEM) equipped with energy dispersive spectrometer (EDS), transmission electron microscopy (TEM), X-ray diffraction (XRD), and nano-indentator. TEM results revealed that both PVD and CVD TiAlSiN coatings consisted of nanocrystalline embedded in SiN<sub>x</sub> amorphous. The nanohardness of CVD Ti<sub>0.13</sub>Al<sub>0.85</sub>Si<sub>0.02</sub>N coating obtained in this work was 31.7 ± 1.4 GPa, which was 35% higher than that of the PVD Ti<sub>0.31</sub>Al<sub>0.60</sub>Si<sub>0.09</sub>N coating.