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Ultra-intense laser-driven fast electron beam propagation in a silicon target is studied by three-dimensional hybrid particle-in-cell–fluid simulations. It is found that the transverse spatial profile of the fast electron beam has a significant influence on the propagation of the fast electrons. In the case of a steep spatial profile (e.g., a super-Gaussian profile), a tight fast electron beam is produced, and this excites more intense resistive magnetic fields, which pinch the electron beam strongly, leading to strong filamentation of the beam. By contrast, as the gradient of the spatial profile becomes more gentle (e.g., in the case of a Lorentzian profile), the resistive magnetic field and filamentation become weaker. This indicates that fast electron propagation in a solid target can be controlled by modulating the spatial gradient of the laser pulse edge.