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Fast actuation with nanoprecision over a large range has been a challenge in advanced intelligent manufacturing like lithography mask aligner. Traditional stacked stage method works effectively only in a local, limited range, and vibration coupling is also challenging. Here, we design a dual mechanism multimodal linear actuator (DMMLA) consisted of piezoelectric and electromagnetic costator and coslider for producing macro-, micro-, and nanomotion, respectively. A DMMLA prototype is fabricated, and each working mode is validated separately, confirming its fast motion (0~50 mm/s) in macromotion mode, micromotion (0~135 μm/s) and nanomotion (minimum step: 0~2 nm) in piezoelectric step and servomotion modes. The proposed dual mechanism design and multimodal motion method pave the way for next generation high-precision actuator development.