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Abstract The control charts are frequently employed in process monitoring to assess the average and variability of a process, assuming a normal distribution. However, it is worth noting that some process distributions tend to exhibit a positively skewed distribution, such as the lognormal distribution. This article proposed a maximum exponential weighted moving average control chart for joint monitoring of mean and variance under a lognormal process. The proposed control chart is evaluated by using the run length profile such as ARL and SDRL. The Monte Carlo simulation is conducted by using the R language to find the run length profile. An application is presented to demonstrate the design of the proposed control chart.