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A surface plasmon interference lithography technique to fabricate subwavelength circular grating by continuous rotating and exposing lithography sample is theoretically demonstrated. Based on the theory of surface plasmon interference lithography in combination with coordinate transformation, the period and contrast of the subwavelength circular grating are analyzed by simulating the corresponding magnetic field intensity distribution. It is believed that this technique can be applied to practical experiments, which provides an interesting alternative for the fabrication of subwavelength circular grating. Keywords: Nanolithography, Subwavelength circular grating, Surface plasmon