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Improved Uniformity and Endurance Through Suppression of Filament Overgrowth in Electrochemical Metallization Memory With AgInSbTe Buffer Layer
oleh: Ye Tao, Xuhong Li, Haiyang Xu, Zhongqiang Wang, Wentao Ding, Weizhen Liu, Jiangang Ma, Yichun Liu
Format: | Article |
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Diterbitkan: | IEEE 2018-01-01 |
Deskripsi
We demonstrated an effective approach to suppress conductive filament (CF) overgrowth through the introduction of a AgInSbTe (AIST) buffer layer into amorphous carbon-based electrochemical metallization memory devices. The overshoot current (I<sub>OS</sub>) was monitored in real-time for the devices with and without the AIST layer. Our results indicates that the I<sub>OS</sub> was eliminated after insertion of the buffer layer. The effect of the AIST layer on CF overgrowth suppression could be attributed to the lower V<sub>SET</sub> and capacity to hold excess Ag-ions. The optimized Pt/a-C/AIST/Ag devices exhibited highly uniform switching parameters, fast switching speed (<;50 ns) and excellent cycling endurance (5×10<sup>6</sup> cycles).