Improved Uniformity and Endurance Through Suppression of Filament Overgrowth in Electrochemical Metallization Memory With AgInSbTe Buffer Layer

oleh: Ye Tao, Xuhong Li, Haiyang Xu, Zhongqiang Wang, Wentao Ding, Weizhen Liu, Jiangang Ma, Yichun Liu

Format: Article
Diterbitkan: IEEE 2018-01-01

Deskripsi

We demonstrated an effective approach to suppress conductive filament (CF) overgrowth through the introduction of a AgInSbTe (AIST) buffer layer into amorphous carbon-based electrochemical metallization memory devices. The overshoot current (I<sub>OS</sub>) was monitored in real-time for the devices with and without the AIST layer. Our results indicates that the I<sub>OS</sub> was eliminated after insertion of the buffer layer. The effect of the AIST layer on CF overgrowth suppression could be attributed to the lower V<sub>SET</sub> and capacity to hold excess Ag-ions. The optimized Pt/a-C/AIST/Ag devices exhibited highly uniform switching parameters, fast switching speed (&lt;;50 ns) and excellent cycling endurance (5&#x00D7;10<sup>6</sup> cycles).