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Reversible Redox Property of Co(III) in Amorphous Co-doped SiO<sub>2</sub>/γ-Al<sub>2</sub>O<sub>3</sub> Layered Composites
oleh: Shotaro Tada, Shota Saito, Akito Mori, Hideki Mizuno, Shiori Ando, Toru Asaka, Yusuke Daiko, Sawao Honda, Samuel Bernard, Yuji Iwamoto
| Format: | Article |
|---|---|
| Diterbitkan: | MDPI AG 2020-11-01 |
Deskripsi
This paper reports on a unique reversible reducing and oxidizing (redox) property of Co(III) in Co-doped amorphous SiO<sub>2</sub>/γ-Al<sub>2</sub>O<sub>3</sub> composites. The Fenton reaction during the H<sub>2</sub>O<sub>2</sub>-catalyzed sol–gel synthesis utilized in this study lead to the partial formation of Co(III) in addition to Co(II) within the composites. High-resolution transmission electron microscopy (HRTEM) and high-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM) analyses for the composite powder sample with a composition of Al:Si:Co = 85:10:5 showed the amorphous state of the Co-doped SiO<sub>2</sub> that modified γ-Al<sub>2</sub>O<sub>3 </sub>nanocrystalline surfaces. In situ X-ray absorption fine structure (XAFS) spectroscopic analysis suggested reversible redox reactions of Co species in the composite powder sample during heat-treatment under H<sub>2</sub> at 500 °C followed by subsequent cooling to RT under Ar. Further analyses by in situ IR spectroscopy combined with cyclic temperature programmed reduction/desorption (TPR/TPD) measurements and X-ray photoelectron spectroscopic (XPS) analysis revealed that the alternating Co(III)/(II) redox reactions were associated with OH formation (hydrogenation)-deformation (dehydrogenation) of the amorphous aluminosilicate matrix formed in situ at the SiO<sub>2</sub>/γ-Al<sub>2</sub>O<sub>3</sub> hetero interface, and the redox reactions were governed by the H<sub>2</sub> partial pressure at 250–500 °C. As a result, a supported mesoporous γ-Al<sub>2</sub>O<sub>3</sub>/Co-doped amorphous SiO<sub>2</sub>/mesoporous γ-Al<sub>2</sub>O<sub>3</sub> three-layered composite membrane exhibited an H<sub>2</sub>-triggered chemical valve property: mesopores under H<sub>2</sub> flow (open) and micropores under He flow (closure) at 300–500 °C.