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A new family of Transition Metallic Nitrides (5d Transition Metal with Nitrogen, NMT) has been produced by Plasma Assisted System. In this work an arc pulsed - Plasma Assisted Physical Vapor Deposition system (PAPVD) to grow Gold Nitride thin films (AuN) was used. The binding energies of 398.1 eV, 84.7 eV and 88.36 eV, to N1s and Au4f nar- row spectrum respectively were determined trough X-Ray Photoelectron Spectroscopy (XPS). Additionally using X- Ray Diffraction (XRD) a widening of the Au Bragg diffraction lines was observed, which could be attributed to new phases produced for inclution of nitrogen atom inside Au lattice. Using Atomic Force Microscopy (AFM) the granular character of the samples was verified and the grain sizes were determined. Additionally the conductive character of these samples was observed by Scanning Tunnel Microscopy (STM).