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The Fabrication and Characterization of InAlAs/InGaAs APDs Based on a Mesa-Structure with Polyimide Passivation
oleh: Jheng-Jie Liu, Wen-Jeng Ho, June-Yan Chen, Jian-Nan Lin, Chi-Jen Teng, Chia-Chun Yu, Yen-Chu Li, Ming-Jui Chang
Format: | Article |
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Diterbitkan: | MDPI AG 2019-08-01 |
Deskripsi
This paper presents a novel front-illuminated InAlAs/InGaAs separate absorption, grading, field-control and multiplication (SAGFM) avalanche photodiodes (APDs) with a mesa-structure for high speed response. The electric fields in the InAlAs-multiplication layer and InGaAs-absorption layer enable high multiplication gain and high-speed response thanks to the thickness and concentration of the field-control and multiplication layers. A mesa active region of 45 micrometers was defined using a bromine-based isotropic wet etching solution. The side walls of the mesa were subjected to sulfur treatment before being coated with a thick polyimide layer to reduce current leakage, while lowering capacitance and increasing response speeds. The breakdown voltage (V<sub>BR</sub>) of the proposed SAGFM APDs was approximately 32 V. Under reverse bias of 0.9 V<sub>BR</sub> at room temperature, the proposed device achieved dark current of 31.4 nA, capacitance of 0.19 pF and multiplication gain of 9.8. The 3-dB frequency response was 8.97 GHz and the gain-bandwidth product was 88 GHz. A rise time of 42.0 ps was derived from eye-diagrams at 0.9 V<sub>BR</sub>. There was notable absence of intersymbol-interference and the signals remained error-free at data-rates of up to 12.5 Gbps.