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Ion implantation is usually used for semiconductor doping and isolation, which creates defects in semiconductors. ZnO is a promising semiconductor and has a variety of applications, such as for use in transparent electronics, optoelectronics, chemical and biological sensors, etc. In this work, ZnO nanorods were grown on Si (100) substrates by the process of chemical bath deposition and then annealed in an O₂ atmosphere at 350 and 600 °C for 1 h to introduce different kinds of defects. The as-grown nanorods and the nanorods that annealed were irradiated simultaneously by 180 keV H⁺ ions at room temperature with a total dose of <inline-formula><math xmlns="http://www.w3.org/1998/Math/MathML" display="inline"><semantics><mrow><mn>8.0</mn><mo>×</mo><msup><mrow><mn>10</mn></mrow><mrow><mn>15</mn></mrow></msup><mrow><mo> </mo><mi>ions</mi></mrow><mo>/</mo><msup><mrow><mi>cm</mi></mrow><mn>2</mn></msup></mrow></semantics></math></inline-formula>. The radiation effects of the H⁺ ions, effects of the pre-existed defects on the radiation resistance, and the related mechanisms under irradiation were investigated. The crystal and optical properties of the ZnO nanorods after H⁺ ion irradiation were found to depend upon the pre-existed defects in the nanorods. The existence of the appropriate concentration of oxygen interstitials in the ZnO nanorods caused them to have good radiation resistance. The thermal effects of irradiation played an important role in the property variation of nanorods. The temperature of the nanorods under 180 keV H⁺ ion bombardment was around 350 °C.