Mapping Oxidation and Wafer Cleaning to Device Characteristics Using Physics-Assisted Machine Learning
oleh: Sparsh Pratik, Po-Ning Liu, Jun Ota, Yen-Liang Tu, Guan-Wen Lai, Ya-Wen Ho, Zheng-Kai Yang, Tejender Singh Rawat, Albert S. Lin
| Format: | Article |
|---|---|
| Diterbitkan: | American Chemical Society 2022-01-01 |
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