Unraveling the Mechanism of Maskless Nanopatterning of Black Silicon by CF4/H2 Plasma Reactive-Ion Etching
oleh: Francesco Ghezzi, Matteo Pedroni, Janez Kovač, Federica Causa, Anna Cremona, Mariano Anderle, Roberto Caniello, Silvia M. Pietralunga, Espedito Vassallo
| Format: | Article |
|---|---|
| Diterbitkan: | American Chemical Society 2022-07-01 |
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