A Trench LDMOS Improved by Quasi Vertical Super Junction and Resistive Field Plate

oleh: Junji Cheng, Shiying Wu, Weizhen Chen, Haimeng Huang, Bo Yi

Format: Article
Diterbitkan: IEEE 2019-01-01

Deskripsi

An improved trench lateral double-diffused MOSFET (T-LDMOS) is proposed. It has a quasi vertical super junction (QVSJ) drift region and adopts a resistive field plate (RFP) to help QVSJ satisfy charge-balance. The realization of RFP barely complicates the device fabrication, but it motivates QVSJ to significantly improve the relationship between breakdown voltage (BV) and specific on-state resistance (R<sub>ON,SP</sub>). The simulation results show that compared with the conventional QVSJ T-LDMOS, the proposed one gains the R<sub>ON,SP</sub> reduced by about 79% under the same BV requirement of about 500 V. It therefore presents an excellent figure of merit (FOM) (FOM = BV<sup>2</sup>/R<sub>ON,SP</sub>, Baliga's FOM) up to 29.8 MW/cm<sup>2</sup>, which is superior to the prior art and exhibits a bright prospect of saving energy.