Wide range detector of plasma induced charging effect for advanced CMOS BEOL processes

oleh: Yi-Jie Chao, Kai-Wei Yang, Chi Su, Chrong-Jung Lin, Ya-Chin King

Format: Article
Diterbitkan: SpringerOpen 2021-07-01

Deskripsi

Abstract This work proposed a modified plasma induced charging (PID) detector to widen the detection range, for monitoring the possible plasma damage across a wafer during advanced CMOS BEOL processes. New antenna designs for plasma induced damage patterns with extended capacitors are investigated. By adapting the novel PID detectors, the maximum charging levels of the detectors have been enhanced.