Near-field sub-diffraction photolithography with an elastomeric photomask
oleh: Sangyoon Paik, Gwangmook Kim, Sehwan Chang, Sooun Lee, Dana Jin, Kwang-Yong Jeong, I Sak Lee, Jekwan Lee, Hongjae Moon, Jaejun Lee, Kiseok Chang, Su Seok Choi, Jeongmin Moon, Soonshin Jung, Shinill Kang, Wooyoung Lee, Heon-Jin Choi, Hyunyong Choi, Hyun Jae Kim, Jae-Hyun Lee, Jinwoo Cheon, Miso Kim, Jaemin Myoung, Hong-Gyu Park, Wooyoung Shim
| Format: | Article |
|---|---|
| Diterbitkan: | Nature Portfolio 2020-02-01 |
Deskripsi
Photolithography is an established microfabrication technique but commonly uses costly shortwavelength light sources to achieve high resolution. Here the authors use metal patterns embedded in a flexible elastomer photomask with mechanical robustness for generation of subdiffraction patterns as a cost effective near-field optical printing approach.