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For constructing optical and electrical micro-devices, the deposition/printing of materials with sub-1 <inline-formula><math xmlns="http://www.w3.org/1998/Math/MathML" display="inline"><semantics><mi mathvariant="sans-serif">μ</mi></semantics></math></inline-formula>m precision and size (cross-section) is required. Crystalline c-ITO (indium tin oxide) nanostructures were patterned on glass with sufficient precision to form 20–50 nm gaps between individual disks or lines of ∼250 nm diameter or width. The absorbed energy density [J/cm<inline-formula><math xmlns="http://www.w3.org/1998/Math/MathML" display="inline"><semantics><msup><mrow></mrow><mn>3</mn></msup></semantics></math></inline-formula>] followed a second-order dependence on pulse energy. This facilitated high-resolution and precise nanoscale laser-writing at a laser wavelength of 515 nm. Patterns for optical elements such as circular gratings and micro-disks were laser-printed using ITO as a resist. Unexposed amorphous a-ITO was chemically removed in aqueous 1% vol. HF solution. This use of a-ITO as a solid resist holds promise for metamaterial and micro-optical applications.