Nanomanufacturing of silicon surface with a single atomic layer precision via mechanochemical reactions
oleh: Lei Chen, Jialin Wen, Peng Zhang, Bingjun Yu, Cheng Chen, Tianbao Ma, Xinchun Lu, Seong H. Kim, Linmao Qian
| Format: | Article |
|---|---|
| Diterbitkan: | Nature Portfolio 2018-04-01 |
Deskripsi
The continued scaling of silicon based electronic devices requires the development of increasingly innovative approaches for high-precision material removal. Here, the authors demonstrate subnanometre depth removal of silicon using scanning probe, shear-induced mechanochemical reactions.