Multinuclear Tin-Based Macrocyclic Organometallic Resist for EUV Photolithography
oleh: Gayoung Lim, Kangsik Lee, Chawon Koh, Tsunehiro Nishi, Hyo Jae Yoon
| Format: | Article |
|---|---|
| Diterbitkan: | American Chemical Society 2024-03-01 |
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