Influence of purge, time of waiting and TiCl<sub>4</sub> dosing time in a low-pressure atomic layer deposition (ALD) reactor on properties of TiO<sub>2</sub> layer
oleh: W. Walke, M. Kaczmarek, M. Staszuk, M. Basiaga
| Format: | Article |
|---|---|
| Diterbitkan: | Croatian Metallurgical Society 2017-01-01 |
Deskripsi
The aim of the study was to evaluate the influence of the ALD process parameters on mechanical properties and corrosion resistance of TiO<sub>2</sub> layer. The TiO<sub>2</sub> layer was deposited on stainless steel surfaces at constant temperature T = 200 °C and number of cycles n<sub>c</sub> = 500 (g ≈ 25 nm). The applied methodology consisted of potentiodynamic and impedance studies, as well as adhesion test. The obtained results were the basis for selection of surface treatment method for stainless steel implants for contact with blood. Appropriate parameters of surface treatment realized by means of the ALD method is of significant importance. It will contribute to the development of technological conditions of specified deposition parameters of TiO<sub>2</sub> layers on steel implants.