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Polymer brush hypersurface photolithography
oleh: Carlos Carbonell, Daniel Valles, Alexa M. Wong, Andrea S. Carlini, Mollie A. Touve, Joanna Korpanty, Nathan C. Gianneschi, Adam B. Braunschweig
Format: | Article |
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Diterbitkan: | Nature Portfolio 2020-03-01 |
Deskripsi
Various lithographic approaches are being explored to create polymer brush patterns with micrometer-scale feature dimensions. Here the authors demonstrate a printing approach which allows independent control of the monomer composition and feature height of each pixel in a pattern, while circumventing the need for expensive photomasks.