Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD oleh Xiao-Ying Zhang, Chia-Hsun Hsu, Yun-Shao Cho, Shui-Yang Lien, Wen-Zhang Zhu, Song-Yan Chen, Wei Huang, Lin-Gui Xie, Lian-Dong Chen, Xu-Yang Zou, Si-Xin Huang