Hasil Pencarian - Jung Hun Kwak

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  1. 1
    Silicon Oxide Etching Process of NF<sub>3</sub> and F<sub>3</sub>NO Plasmas with a Residual Gas Analyzer

    Silicon Oxide Etching Process of NF<sub>3</sub> and F<sub>3</sub>NO Plasmas with a Residual Gas Analyzer oleh Woo-Jae Kim, In-Young Bang, Ji-Hwan Kim, Yeon-Soo Park, Hee-Tae Kwon, Gi-Won Shin, Min-Ho Kang, Youngjun Cho, Byung-Hyang Kwon, Jung-Hun Kwak, Gi-Chung Kwon

    Diterbitkan 2021-06-01
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  2. 2
    Etch characteristics of maskless oxide/nitride/oxide/nitride (ONON) stacked structure using C4H2F6-based gas

    Etch characteristics of maskless oxide/nitride/oxide/nitride (ONON) stacked structure using C4H2F6-based gas oleh Nam Il Cho, Jong Woo Hong, Hee Jin Yoo, Hyeong Joon Eoh, Chan Ho Kim, Jun Won Jeong, Kyung Lim Kim, Jung Hun Kwak, Yong Jun Cho, Dong Woo Kim, Geun Young Yeom

    Diterbitkan 2024-10-01
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