Optimized plasma-assisted bi-layer photoresist fabrication protocol for high resolution microfabrication of thin-film metal electrodes on porous polymer membranes oleh Patrick Schuller, Mario Rothbauer, Christoph Eilenberger, Sebastian R.A. Kratz, Gregor Höll, Philipp Taus, Markus Schinnerl, Jakob Genser, Peter Ertl, Heinz Wanzenboeck