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    One-Step Cost-Effective Growth of High-Quality Epitaxial Ge Films on Si (100) Using a Simplified PECVD Reactor

    One-Step Cost-Effective Growth of High-Quality Epitaxial Ge Films on Si (100) Using a Simplified PECVD Reactor oleh Jignesh Vanjaria, Venkat Hariharan, Arul Chakkaravarthi Arjunan, Yanze Wu, Gary S. Tompa, Hongbin Yu

    Diterbitkan 2021-10-01
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